e-space
Manchester Metropolitan University's Research Repository

    A new approach to the deposition of elemental boron and boron-based coatings by pulsed magnetron sputtering of loosely packed boron powder targets

    Audronis, Martynas, Kelly, Peter, Leyland, Adrian and Matthews, Allan (2007) A new approach to the deposition of elemental boron and boron-based coatings by pulsed magnetron sputtering of loosely packed boron powder targets. In: Tenth International Conference on Plasma Surface Engineering, 10th September 2006 - 15th September 2006, Garmisch-Partenkirchen, Germany.

    File not available for download.

    Abstract

    Large numbers of potential application areas for elemental boron and boron-based thin film materials make this subject area a focus of significant scientific and industrial interest. Applications include thermoelectric energy conversion devices, biomedical implants, metalworking tools and automotive components. Boron is however also recognised widely to be a difficult-to-deposit material. Therefore, a new technique to deposit boron (and other boron-based materials) by pulsed magnetron sputtering of loosely packed powder targets has been proposed. Among the benefits of this approach are: improved stability of the deposition process, increased speed and flexibility of target preparation, enhanced time- and cost-effectiveness and the ability to control readily the target and hence the chemical composition of the coating.

    Impact and Reach

    Statistics

    Activity Overview
    6 month trend
    0Downloads
    6 month trend
    547Hits

    Additional statistics for this dataset are available via IRStats2.

    Altmetric

    Repository staff only

    Edit record Edit record