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Measurements of deposition rate and substrate heating in a HiPIMS discharge

West, Glen T., Kelly, Peter, Barker, Paul, Mishra, Anurag and Bradley, James (2009) Measurements of deposition rate and substrate heating in a HiPIMS discharge. ISSN 1612-8869

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The thermal energy flux delivered to the substrate position was measured for continuous-dc, pulsed dc- and high-power impulse magnetron sputtering (HiPIMS) magnetron discharges at the same time-averaged discharge powers. These values were subsequently normalised for measured deposition rates. Titanium coatings were grown under the same process conditions and analysed for alterations in crystal structure via X-ray diffraction. The HiPIMS discharges were found to deliver a significantly lower normalised thermal energy flux to the substrate than both continuous-dc and pulsed-dc sputtering, which is of potential benefit in coating temperature-sensitive substrates; whilst also enabling frequency-dependent modification of film properties resulting from the ionised deposition flux inherent in this process.

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